The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 6465855 B1

PDF
Full Text
Expired
Date of Patent:
Oct. 15, 2002

Filed:

May. 18, 2001
Applicant:
Inventors:
Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 2/982 ;
U.S. Cl.
CPC ...
H01L 2/982 ;
Abstract

A micromachined structure able to operate at a high temperature, including a deformable membrane secured on a support allowing for its deformation. The membrane includes at least a membrane layer in a material retaining its elasticity for the high operating temperature. The membrane layer supporting components detect the deformation of the membrane, made in a semiconducting material, and it has an electrically insulating interface with the detection components, formed by an electrically insulating layer. The support is made in a material enabling the membrane to be released by a microelectronics technique.


Find Patent Forward Citations

Jaussaud, Claude. (2002). Micromachined structure with a deformable membrane and method for making same (U.S. Patent No. 6465855). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6465855

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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