The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 15, 2002

Filed:

May. 31, 2001
Applicant:
Inventor:

Shekhar Pramanick, Fremont, CA (US);

Assignee:

Advanced Micro Devices, Inc., Sunnyvale, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 2/14763 ;
U.S. Cl.
CPC ...
H01L 2/14763 ;
Abstract

A method of manufacturing a semiconductor device includes: providing a semiconductor with a dielectric layer formed thereon; forming an opening in said dielectric layer, said opening defined by walls of said dielectric layer and exposes a portion of said semiconductor, forming a conductive layer in said opening; removing said conductive layer to said dielectric layer; and forming a barrier layer over said conductive layer and said dielectric layer, said barrier layer made of a compound of silicon nitride with a third material compounded therein wherein said third material is modulated in amount through said layer of silicon nitride.


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