The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 15, 2002
Filed:
Jan. 25, 2000
Dosuk D. Lee, Brookline, MA (US);
Atul Nagras, Somerville, MA (US);
Pramod Chakravarthy, Arlington, MA (US);
Anthony M. Majahad, Cambridge, MA (US);
Etex Corporation, Cambridge, MA (US);
Abstract
An irregularly etched metallic medical implant device is provided having random non-uniform relief patterns on the surface ranging from about 0.3 &mgr;m to less than about 20 &mgr;m in depth. The random, irregular surface as defined by the etch micromorphology and respective dimensional properties is sobtained by exposing a surface to a reactive plasma in a chamber wherein said reactive plasma produces a reaction product with the surface to thereby etch the surface, said reaction product or a complex thereof having a vapor pressure lower than a pressure in the chamber; providing a dynamic masking agent during the etching process; and removing the reaction products.