The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 15, 2002
Filed:
Jun. 22, 2000
Jene A. Golovchenko, Lexington, MA (US);
Daniel Branton, Lexington, MA (US);
Derek M. Stein, Somerville, MA (US);
Ciaran J. McMullan, Co Derry, IE;
Jiali Li, Cambridge, MA (US);
President and Fellows of Harvard College, Cambridge, MA (US);
Abstract
There is provided controlled fabrication of a solid state structural feature on a solid state structure by exposing the structure to a fabrication process environment the conditions of which are selected to produce a prespecified feature in the structure. A physical detection species is directed toward a designated structure location during process environment exposure of the structure, and the detection species is detected in a trajectory from traversal of the designated structure location, to indicate changing physical dimensions of the prespecified feature. The fabrication process environment is then controlled in response to the physical species detection to fabricate the structural feature. Also provided is a method for controlling a physical dimension of a structural feature or to form a feature by exposing the structure to a flux of ions at a selected structure temperature, the exposure conditions being controlled to cause formation of the feature or to cause at least one physical dimension of the feature to be changed, substantially by transport of material of the structure to the structural feature in response to the ion flux exposure.