The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 15, 2002
Filed:
Aug. 29, 2000
Applicant:
Inventors:
Siegfried Mantl, Jülich, DE;
Bernhard Holländer, Bergisch-Gladbach, DE;
Ralf Liedtke, Bergisch-Gladbach, DE;
Assignee:
Forschungszentrum Julich GmbH, Julich, DE;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C30B 2/518 ;
U.S. Cl.
CPC ...
C30B 2/518 ;
Abstract
The invention relates to a method for the production of a monocrystalline layer on a substrate with a non-adapted lattice. To this end, a monocrystalline substrate with a buried amply defective layer and a monocrystalline layer produce thereon are used. The buried amply defective layer can be produced by hydrogen implantation.