The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 15, 2002

Filed:

Nov. 22, 2000
Applicant:
Inventors:

Jill Portman, Sausalito, CA (US);

Gary Shinner, Sausalito, CA (US);

Michael Barry, Palo Alto, CA (US);

Assignee:

Mighty Leaf Tea, Sausalito, CA (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
A47G 1/922 ;
U.S. Cl.
CPC ...
A47G 1/922 ;
Abstract

Apparatus and methods for the individual controlled preparation of a beverage from one or more beverage bags within a variety of containers and the quick and sanitary storage of the bag or bags once the beverage preparation has been completed. Preferably, the beverage preparation and bag storage apparatus is sized and shaped to be seated on the lip of a container to cover the mouth of the container. The apparatus includes a raised container lid bag retention structure that is openable or open such that at least a portion of the beverage bag may be drawn within and thereby retained in a position elevated above the beverage so that the beverage can be sampled and consumed even with the apparatus in place on the container and the bag or bags retained within the apparatus. One embodiment of such apparatus includes a rounded raised area having a patterned area, such as weakenings formed in or perforations or incisions cut through the flexible cover panel, that can be opened partially or completely to provide a string/tag securing aperture or completely to provide a bag retention aperture by the application of respectively increasing amounts of pressure at the patterned area.


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