The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 08, 2002

Filed:

Jul. 30, 1999
Applicant:
Inventor:

David Stanley Immel, Santa Barbara, CA (US);

Assignee:

Silicon Graphics, Inc., Mountain View, CA (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G06T 1/570 ;
U.S. Cl.
CPC ...
G06T 1/570 ;
Abstract

A system for in-scene cloth modification that allows a user to make modifications to cloth during animation of objects associated with the cloth and have the new geometry updated in the in-scene cloth without having to start the animation from the beginning. Modified panels of the cloth are mapped into the counterpart panels of the simulated cloth by morphing the modified panels from a cloth definition into the space of the old panels in the scene. A relaxation of the cloth allows the new panel to take its natural shape in the animation. The mapping, when cloth is added, also includes finding each new panel vertex a location in the original or old panel.


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