The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 08, 2002
Filed:
May. 25, 1999
Applicant:
Inventors:
Sun-Bong Choi, Kyunggi-do, KR;
Dong-Ha Lim, Kyunggi-do, KR;
Hyo-Sang Jung, Kyunggi-do, KR;
Sung-Kyu Han, Kyunggi-do, KR;
Assignee:
Samsung Electronics Co., Ltd., Kyunggi-Do, KR;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 3/7317 ;
U.S. Cl.
CPC ...
H01J 3/7317 ;
Abstract
An ion implantation apparatus for integrated circuit manufacturing is disclosed. In an apparatus in accordance with an embodiment of the invention, a current detector detects a current flowing to a turbo pump. A display displays information about the detected current, and a controller determines whether the detected current is within a specified range. If the detected current is not within the specified range, the controller issues a power control signal to, stop the turbo pump. At this time, the controller also stops an ion implantation of the apparatus.