The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 08, 2002
Filed:
Apr. 27, 2001
Applicant:
Inventors:
Jack (ChanKou) Hwang, Boulder, CO (US);
Eugene Tarlton, Louisville, CO (US);
Anthony D. Piscopio, Longmont, CO (US);
Assignee:
Array BioPharma, Inc., Boulder, CO (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C07C / ;
U.S. Cl.
CPC ...
C07C / ;
Abstract
Disclosed is a process for selectively reducing a nitrile containing organic compound that also contains a sulfone moiety, the nitrile being reduced to a primary amine.
Hwang, Jack (ChanKou). (2002). Process for the reduction of cyano-substituted sulfones to aminoalkylene-substituted sulfones (U.S. Patent No. 6462238). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6462238
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile