logo

For the Inventor, By the Inventor

The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 6461581 B1

PDFFull Text
Date of Patent:
Oct. 08, 2002

Filed:

Aug. 02, 2000

Clathrate compounds and manufacturing method thereof

Applicant:
Inventors:

Haruki Eguchi, Tokyo, JP;

Akihiko Suzuki, Souka, JP;

Satoshi Takahashi, Yokohama, JP;

Kaoru Miyahara, Ichikawa, JP;

Tohru Tanaka, Matsudo, JP;

Shigemitsu Kihara, Tachikawa, JP;

Kazuo Tsumuraya, Atsugi, JP;

Assignee:

Other;

Attorney:

Pearne & Gordon LLP

Primary Examiner:

Stanley S Silverman

Assistant Examiner:

Timothy C Vanoy

Int. Cl.
CPC ...
C01B 3/100 ; C01B 3/300 ;
U.S. Cl.
CPC ...
C01B 3/100 ; C01B 3/300 ;
Abstract

The present invention provides a clathrate compound which can be used as a thermoelectric material, a hard material, or a semiconductor material. Silicon or carbon are formed into a clathrate lattice, and a clathrate compound is then formed in which specified doping atoms are encapsulated within the clathrate lattice, and a portion of the atoms of the clathrate lattice are substituted with specified substitution atoms. The clathrate lattice is, for example, a silicon clathrate (Si ) mixed lattice of a Si cluster including a dodecahedron of Si atoms, and a Si cluster including a hexahedron of Si atoms. Suitable doping atoms are atoms from group 1A, group 2A, group 3A, group 1B, group 2B, group 3B, group 4A, group 5A, group 6A, and group 8, and suitable substitution atoms are atoms from group 1A, group 2A, group 3A, group 1B, group 2B, group 3B, group 5A, group 6A, group 7A, group 5B, group 6B, group 7B, and group 8 of the periodic table. Suitable manufacturing methods include melt methods and sintering methods, and moreover intercalant intercalation compounds or the like may also be used as raw materials.

Find Patent Forward Citations

Eguchi, Haruki. (2002). Clathrate compounds and manufacturing method thereof (U.S. Patent No. 6461581). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6461581

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Loading…