The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 01, 2002
Filed:
Sep. 22, 2000
Derrick C. Mancini, Riverside, IL (US);
The University of Chicago, Chicago, IL (US);
Abstract
A method is provided for fabricating precision x-ray collimators including precision focusing x-ray collimators. Fabricating precision x-ray collimators includes the steps of using a substrate that is electrically conductive or coating a substrate with a layer of electrically conductive material, such as a metal. Then the substrate is coated with layer of x-ray resist. An intense radiation source, such as a synchrotron radiation source, is utilized for exposing the layer of x-ray resist with a pattern of x-ray. The pattern delineates a grid of apertures to collimate the x-rays. Exposed parts of the x-ray resist are removed. Regions of the removed x-ray resist are electroplated. Then remaining resist is optionally removed from the substrate. When exposing the layer of x-ray resist with a pattern of x-ray for non-focusing collimators, the substrate is maintained perpendicular to impinging x-rays from the synchrotron radiation source; and the substrate is scanned vertically. For precision focusing x-ray collimators, the substrate is scanned vertically in the z-direction while varying the angle of inclination of the substrate in a controlled way as a function of the position of the z-direction during the scan.