The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 01, 2002

Filed:

Jun. 14, 1996
Applicant:
Inventors:

Minako Sugiura, Tokyo, JP;

Shigeo Kubota, Kanagawa, JP;

Naoya Eguchi, Tokyo, JP;

Assignee:

Sony Corporation, Tokyo, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01B 1/124 ;
U.S. Cl.
CPC ...
G01B 1/124 ;
Abstract

A second harmonic generating element radiates a laser beam having a wavelength of 532 nm onto a substrate surface. The laser beam corresponds to the second harmonic beam of a fundamental laser beam having a wavelength of 1064 nm. An emitting optical system emits the laser beam vertically to the substrate surface so that the laser beam is made linear. An observing means has a optical axis Lo oriented in a different direction from a optical axis Li of the emitting optical system and provides a CCD image sensor served as a two-dimensional imaging device located in conjugation with the height or thickness of the substrate surface. The observing means operates to observe a light section image formed by the linear beam fired by the emitting optical system onto the substrate surface. Then, an image processing means precisely measures the form of the surface of an object to be measured as suppressing degrade of an S/N ratio, on the basis of the image data of the light section image observed by the observing means.


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