The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 01, 2002

Filed:

Jan. 26, 2000
Applicant:
Inventors:

Wen-Chau Liu, Tainan, TW;

Wei-Chou Wang, Tainan, TW;

Shiou-Ying Cheng, Tainan, TW;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 2/973 ; H01L 2/9737 ;
U.S. Cl.
CPC ...
H01L 2/973 ; H01L 2/9737 ;
Abstract

An InP/InGaAlAs heterojunction bipolar transistor with the characteristics of amplification and negative-differential-resistance phenomenon is presented in the invention. The 3-terminal current-voltage characteristics of the heterojunction bipolar transistor can be controlled by the applied base current. In the large collector current regime, the heterojunction bipolar transistor has the characteristics as similar to conventional bipolar junction transistors. However, in a small collector current regime, both the transistor active region and negative-differential-resistance loci are observed. The negative-differential-resistance phenomenon is caused by the insertion of a thin base layer and a &dgr;-doped sheet. Moreover, the use of a setback layer with a thickness of 50 Å added at the emitter-base junction can suppress the diffusion of doping impurity in the base and reduce the potential spike at emitter-base heterojunction so as to improve the confinement of holes injected from base to emitter.


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