The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 01, 2002
Filed:
Oct. 02, 2000
Robert C. Platt, Jr., Laguna Niguel, CA (US);
Mitch Agamohamadi, Orange, CA (US);
Ethicon, Inc., New Brunswick, NJ (US);
Abstract
A method and system for sterilizing an article is provided that includes use of a low frequency (LF) gas discharge plasma. The method includes placing the article in a vacuum chamber and evacuating the vacuum chamber to a predetermined pressure. Gas or vapor species are introduced into the vacuum chamber, and a low frequency plasma is generated within the vacuum chamber, the low frequency plasma having a frequency of from 0 to approximately 200 kHz. The low frequency plasma is maintained for a time period sufficient to substantially remove gas or vapor species from the article. The sterilization system includes a vacuum chamber coupled to a vacuum pump and a vent, a first electrode, and a second electrode. The sterilization system further includes a first region within the vacuum chamber, the first region including a region between the first and second electrodes, and a second region within the vacuum chamber, the second region being in fluid communication with the first region. The sterilization system further includes a source of reactive agent species coupled to the vacuum chamber, a process control monitor, and a low frequency power module including components adapted to apply a low frequency voltage between the first electrode and second electrode to generate a low frequency plasma in the vacuum chamber, the low frequency voltage having a frequency of from 0 to approximately 200 kHz.