The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 24, 2002
Filed:
Apr. 20, 2001
Donald Bennett Hilliard, Tucson, AZ (US);
Other;
Abstract
A light source is disclosed that is well-suited for materials photo-processing of low-absorption media. The present invention utilizes optical filters of very high effective finesse in an optical cavity arrangement, wherein the material medium to be processed traverses a central process space of the cavity. In its preferred embodiment, the disclosed optical system is used for ultraviolet treatment of low-pressure vapors in semiconductor processes such as sputter deposition and etching. The cavity irradiates the vapor with a sufficiently high optical flux to enact significant modification, while avoiding interaction with other components of the materials process. A sputtering apparatus for the depositing or etching of insulating, conducting, or semiconducting thin films is also disclosed, in which the sputtering plasma is irradiated with transverse ultraviolet emission produced by the disclosed light source.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile