The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 24, 2002
Filed:
May. 31, 2000
Applicant:
Inventor:
Kouichi Taniguchi, Kagoshima, JP;
Assignee:
Sony Corporation, Tokyo, JP;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G02F 1/1333 ;
U.S. Cl.
CPC ...
G02F 1/1333 ;
Abstract
There is provided an alignment method of an opposing layout substrate and a device for surely preventing that the internal surface of the substrates (alignment film) is damaged even when the spacer provided between the substrates has a kind of grain size. In the alignment method of opposing layout substrate which performs alignment of two substrates under the condition that the particle material is provided between two substrates provided opposed with each other, the alignment is performed under the condition that a recessed area is formed to at least one opposing surface of two substrates.