The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 24, 2002
Filed:
Jul. 27, 2001
Long-Hai Wu, Taoyuan Shien, TW;
Sakae Tanaka, Taoyuan Shien, TW;
Hannstar Display Corp., Taipei, TW;
Abstract
A method for fabricating a protrusion of a liquid crystal display is disclosed. The method includes steps of providing a substrate pervious to light and having a first thickness, forming a photoresist layer having a second thickness on a first surface of the substrate, providing a photomask over a second surface of the substrate, performing a first exposure with a first exposing light on the photoresist layer with the photomask serving as a mask, wherein a first incident angle of the first exposing light is greater than zero degree, performing a second exposure with a second exposing light on the photoresist layer with the photomask serving as a mask, wherein a second incident angle of the second exposing light is greater than zero degree, and performing a development on the photoresist layer to remove the photoresist layer and form the protrusion on the first surface of the substrate.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile