The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 24, 2002

Filed:

Apr. 27, 2001
Applicant:
Inventors:

Ryan B. Adams, Rochester, NY (US);

Lloyd A. Lobo, Webster, NY (US);

Mridula Nair, Penfield, NY (US);

David C. Boris, Webster, NY (US);

Kevin M. Donovan, Bergen, NY (US);

Assignee:

Eastman Kodak Company, Rochester, NY (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03C 1/74 ; G03C 1/815 ; G03C 1/122 ; B05D 1/30 ;
U.S. Cl.
CPC ...
G03C 1/74 ; G03C 1/815 ; G03C 1/122 ; B05D 1/30 ;
Abstract

A method of reducing the tendency toward formation of coating non-uniformities in the coating of multilayer photographic elements is disclosed. More particularly, the present invention involves the coating of a non-gelatin coating over a topmost gelatin layer in a photographic element. In one embodiment, a processing-solution-permeable overcoat is simultaneously coated with the emulsion layers onto a photographic substrate, which overcoat becomes water and stain resistant in the photochemically processed product. In the latter embodiment, the overcoat formulation comprises at least one water-dispersible hydrophobic polymer interspersed with a water-soluble polymer.


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