The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 24, 2002
Filed:
Jun. 26, 2000
Applicant:
Inventors:
Joseph J. Stevens, San Jose, CA (US);
Yevgeniy Rabinovich, Fremont, CA (US);
Sandy S. Chao, San Jose, CA (US);
Mark R. Denome, San Jose, CA (US);
Allen L. D'Ambra, Millbrae, CA (US);
Donald J. Olgado, Palo Alto, CA (US);
Assignee:
Applied Materials, Inc., Santa Clara, CA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C25B 1/500 ; C25D 2/118 ;
U.S. Cl.
CPC ...
C25B 1/500 ; C25D 2/118 ;
Abstract
A system is provided in which a smaller flow of deposition solution is diverted from a larger flow of deposition solution flowing on an electro-chemical deposition tool platform. The smaller flow is diverted to a dosing unit which may be on a separate platform. The dosing unit in one embodiment comprises a pressurized flow line.