The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 17, 2002
Filed:
Jul. 16, 1998
Kazuya Kamon, Tokyo, JP;
Mitsubishi Denki Kabushiki Kaisha, Tokyo, JP;
Abstract
A method of correcting light proximity effects includes the steps of: compressing design data of a circuit pattern (step S ); generating a projection image which is formed during a process of transferring a pattern onto a wafer, the projection image being generated according to the design data (step S ); predicting the size of the transferred pattern, said prediction being performed from the projection image (step S ); calculating the difference between the predicted size of the transferred pattern and the pattern size designated by the design data (step S ); correcting the compressed design data by an amount equal to the above-described difference (step S ); judging whether the correction amount is within an allowable range (step S ); expanding the corrected data after the correction amount has fallen within the allowable range (step S ); and outputting the resultant data (step S ).