The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 17, 2002
Filed:
May. 17, 1999
Applicant:
Inventor:
Masamichi Oi, Chiba, JP;
Assignee:
Seiko Instruments Inc., , JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 3/7252 ;
U.S. Cl.
CPC ...
H01J 3/7252 ;
Abstract
A method of controlling a magnetic field in the path of a focused charged particle beam of a composite charged particle beam apparatus having at least one focused ion beam lens barrel and at least one electron beam lens barrel comprises the steps of measuring a residual magnetic field within a sample chamber housing the lens barrels, and controlling the magnetic field in the path of the focused charged particle beam so that the magnetic field is maintained at a previously measured value.