The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 17, 2002
Filed:
Dec. 05, 2000
Applicant:
Inventors:
Toshihiko Nagai, Osaka, JP;
Yuichi Miyoshi, Osaka, JP;
Assignee:
Matsushita Electronics Corporation, Osaka J, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 2/1461 ; B08B 6/00 ; C25E 1/00 ;
U.S. Cl.
CPC ...
H01L 2/1461 ; B08B 6/00 ; C25E 1/00 ;
Abstract
After forming a processed film onto the underlying film formed on the substrate, the processed film is dry etched using a mask pattern so as to form an etched pattern. After the reaction product deposited on a wall of the etched pattern is removed by using the first cleaning solution having relatively low power to etch the processed film and the second cleaning solution having relatively high power to etch the processed film in that order, the etched pattern or its vicinity is rinsed with water.