The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 17, 2002
Filed:
Sep. 09, 1999
Yuka Yamada, Kawasaki, JP;
Takehito Yoshida, Machida, JP;
Nobuyasu Suzuki, Tsukuba, JP;
Toshiharu Makino, Tsukuba, JP;
Matsushita Electric Industrial Co., Ltd., Osaka, JP;
Abstract
In a laser ablation method comprising the steps of irradiating a laser beam to target material , and depositing ejected species from the target material on a faced substrate to form a thin film, an ambient gas is introduced into reaction chamber under a constant certain pressure when the laser ablation is performed, using a target material with almost or the same composition as that of a thin film to be obtained. It is thereby possible to obtain a thin film with the same composition as that of the target material readily, without requiring an introduction of O gas and a substrate heating. As a result, it is not necessary to limit materials for a substrate, and it is possible to adjust the adaptability of an anaerobic process.