The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 17, 2002
Filed:
Jun. 22, 2000
Vijaya N. V. Raghavan, Los Altos, CA (US);
Mark Timothy Sullivan, Mountain View, CA (US);
Gerald William Purmal, Los Gatos, CA (US);
Agilent Technologies, Inc, Palo Alto, CA (US);
Abstract
Optics used in a high vacuum environment are mounted by bonding by use of addition polymerizing material which used in that environment. The suitability for use in the high vacuum environment is achieved by precise control of outgassing of trapped and dissolved gases, including low molecular weight hydrocarbons and amines, and unreacted material from component parts of said addition polymerizing material. A plurality of application quantities of the polymer are prepared in a large batch for use as pre-mixed frozen (PMF) material. The use of the large batch enables more precise control of mixture so that near-stoichiometric proportions of the polymer components are easily achieved.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile