The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 17, 2002

Filed:

Feb. 06, 2002
Applicant:
Inventor:

Louis A. Ollivier, Palo Alto, CA (US);

Assignee:

Parker-Hannifin Corporation, Cleveland, OH (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G05D 7/06 ; F16K 3/112 ;
U.S. Cl.
CPC ...
G05D 7/06 ; F16K 3/112 ;
Abstract

A flow control system and method for controlling batchwise delivery of process gas for semiconductor manufacturing are disclosed, wherein the flow control system is operable in a flow mode for delivery of a batch of process gas in a delivery period of time and, alternately, in a no-flow mode. After the start of the delivering, the pressure drop of the gas in a reference capacity of the system is measured for a measurement period of time while interrupting the flow of process gas from a source of the process gas to the reference capacity and continuing to deliver process gas from the system to a semiconductor manufacturing apparatus at a controlled flow rate. The rate of pressure drop in the reference capacity during the measurement period of time is used as a measure of the actual flow rate. Where the actual flow rate does not agree with a specified flow rate for delivering, the controlled flow rate for a subsequent delivery period of time in which another batch of process gas is delivered, is adjusted. Components of the flow control system are arranged along a gas manifold in the form of an elongated delivery stick having a width of less than 1.5 inches, saving important space in a group of the flow control systems that may comprise up to 20 units.


Find Patent Forward Citations

Ollivier, Louis. (2002). Flow control of process gas in semiconductor manufacturing (U.S. Patent No. 6450200). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6450200

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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