The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 17, 2002

Filed:

Sep. 21, 2001
Applicant:
Inventors:

Hitoshi Takeda, Toyokawa, JP;

Kunio Ohta, Toyokawa, JP;

Hitoshi Rokutannda, Toyokawa, JP;

Assignee:

Sintokogio, Ltd., Aichi-ken, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C21D 7/06 ; B21D 5/310 ;
U.S. Cl.
CPC ...
C21D 7/06 ; B21D 5/310 ;
Abstract

The present invention provides a method for a shot-peening processing that can process in one step and thus reduce operating costs and the cost of equipment while increasing the efficiency of the treatment in the peening processing while achieving a peening effect similar to the effect obtained by shot-peening processing a plural number of times, that is, deeply generating compressive residual stress far from the top surface while generating the peak value of the compressive residual stress on the top surface. This method is characterized by projecting, on a product to be subjected to peening, shot in which two or three kinds of particles, each having a different predetermined average particle diameter and having a predetermined average particle diameter ratio to one another, are combined in a predetermined weight ratio.


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