The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 10, 2002

Filed:

Mar. 20, 2000
Applicant:
Inventors:

Ruediger Berger, Heidesheim, DE;

Andreas H. Dietzel, Wallertheim, DE;

Jean Fompeyrine, Waedenswil, CH;

Frank Krause, Mainz, DE;

Jean-Pierre Locquet, Rueschlikon, CH;

Erich Maechler, Siebnen, CH;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01R 3/302 ; G01R 3/3032 ; G01R 3/310 ; G01R 3/312 ; G01N 2/300 ;
U.S. Cl.
CPC ...
G01R 3/302 ; G01R 3/3032 ; G01R 3/310 ; G01R 3/312 ; G01N 2/300 ;
Abstract

Magnetic characterization of the magnetic field emanating from an RWH device is presented using a magnetostrictive layer as a probe between the device and the scanned SFM tip. The findings suggest a very promising technique to resolve magnetic fields laterally at least in the 100 nm realm. Other magnetosensitive properties such as the magnetoelastic and the piezomagnetic effect can be used in a similar way to infer magnetic characteristics of microstructures or of magnetic multilayers.


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