The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 10, 2002
Filed:
Jun. 22, 2000
Applicant:
Inventors:
Kil Sung Lee, Seoul, KR;
Seok Jin Kim, Taejon-shi, KR;
Jae Seok Lee, Euiwang-shi, KR;
Tu Won Chang, Taejon-shi, KR;
Assignee:
Cheil Industries, Inc., Kyongsang-Pukdo, KR;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C09K 1/300 ; C23F 1/00 ;
U.S. Cl.
CPC ...
C09K 1/300 ; C23F 1/00 ;
Abstract
Disclosed is a polishing composition which comprises an Al O /SiO composite-based metal oxide powder, deionized water and an additive, said metal oxide powder comprising an Al O /SiO composite as an essential component. The polishing composition is superior in removal rate and free of causing microscratches after polishing and thus, suitable for use in the global planarization of device wafer surfaces.