The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 03, 2002
Filed:
Mar. 17, 2000
Applicant:
Inventors:
Robert Rupaner, Ellerstadt, DE;
Gerhard Bauer, Weinheim, DE;
Sven Lawrenz, Mannheim, DE;
Claudia Heibel, Weinheim, DE;
Johannes Dobbelaar, Wachenheim, DE;
Assignee:
BASF Aktiengesellschaft, Ludwigshafen, DE;
Primary Examiner:
Int. Cl.
CPC ...
C08F 6/00 ;
U.S. Cl.
CPC ...
C08F 6/00 ;
Abstract
A process is described for effectively reducing the residual monomer content of an aqueous polymer dispersion by aftertreatment at atmospheric pressure or above with an initiator system comprising a) a hydroperoxide, hydrogen peroxide or a peracid, and b) an &agr;-hydroxy carboxylic acid, such as tartaric acid, or with a salt thereof.
Rupaner, Robert. (2002). Method of reducing the content of residual monomers in aqueous polymer dispersions (U.S. Patent No. 6444760). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6444760
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile