The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 03, 2002
Filed:
Mar. 13, 2001
Applicant:
Inventor:
Hidenori Shibata, Kawasaki, JP;
Assignee:
Kabushiki Kaisha Toshiba, Kawasaki, JP;
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 2/132 ;
U.S. Cl.
CPC ...
H01L 2/132 ;
Abstract
After a contact hole is filled with an antireflection film and a resist film, the resist film is patterned such that the resist film of an area larger than the opening of the portion where the contact hole is to be formed is left above the contact hole. The antireflection film is removed with the patterned resist film used as a mask, followed by forming a second interlayer film on the entire surface. The second interlayer film is planarized so as to expose at least the upper surface of the resist film to the outside. Then, the resist film and the antireflection film are removed so as to form a contact hole and a groove.