The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 03, 2002

Filed:

Aug. 02, 2000
Applicant:
Inventors:

Joan Manuel Garcia, Barcelona, ES;

Antoni Gil Miquel, Barcelona, ES;

Elizabeth Zapata, Barcelona, ES;

Izhak Baharav, San Jose, CA (US);

Doron Shaked, Haifa, IL;

Santiago Garcia-Reyero, Barcelona, ES;

Assignee:

Hewlett-Packard Company, Palo Alto, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B41J 2/21 ;
U.S. Cl.
CPC ...
B41J 2/21 ;
Abstract

One invention aspect forms a mask and matrix of corresponding backups for values in the mask, checks when a mask value is not working, and replaces only that value with only a matching matrix entry. A second matrix of further backups is best formed. Another aspect forms a mask as a matrix of stacks of matching entries for mask positions; selects an entry for each position from the matching matrix stack; and prints using the selected entry at each position. Another aspect forms a mask as a matrix of stacks of matching entries for mask positions, and rotates each stack to select an entry for each position. Another aspect forms a mask and a matrix of stacks of backups; finds nonworking mask values and replaces such values with backups from a matching stack. Another aspect forms a seminal mask, tiles it to make a larger one with related properties, and injects noise to disrupt tiling-caused regularity and form a less-regular mask.


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