The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 27, 2002
Filed:
Mar. 01, 2001
Jaiqi Xiao, Houston, TX (US);
Ingo M. Geldmacher, Houston, TX (US);
Baker Hughes Incorporated, Houston, TX (US);
Abstract
In highly deviated wells or when the relative dip angle between formation layering and wellbore axis is large, array induction measurements exhibit erratic spikes, misleading curve separations, and inaccurated resistivity values, preventing log analysts from accuratly evaluating invasion and formation resistivities. Our newly developed deviated-well software focusing (DSF) method that is derived from the Born approximation simultaneously accounts for all these dipping effects. The induction response is separated into two portions: a background response and a perturbation respones. An inhomogeneous, anisotropic background formation model is used to calculate the background response, and the perturbation response is interpreted through a software focusing technique. The combination of the two solutions is the final result.