The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 27, 2002
Filed:
Jul. 15, 1999
Applicant:
Inventor:
Fumio Kobayashi, Omiya, JP;
Assignee:
Fuji Photo Optical Co., Ltd., Saitama, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C01B 1/114 ;
U.S. Cl.
CPC ...
C01B 1/114 ;
Abstract
In a pattern projection measurement grating, each cycle of the total amplitude of a sine wave is divided into eight sections, and each of thus divided sections is divided into white regions W and black regions B according to the ratio between the area S of the sine wave and the area So of a rectangular wave having the same amplitude as the sine wave in this section, so as to constitute a black and white binary pattern. Thus obtained pseudo sine wave density distribution is a density pattern close to the sine wave.
Quick Actions:
Kobayashi, Fumio. (2002). Pattern projection measurement grating (U.S. Patent No. 6441909). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6441909
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile