The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 27, 2002

Filed:

Oct. 07, 1999
Applicant:
Inventors:

Akiyoshi Suzuki, Tokyo, JP;

Yoshiyuki Sekine, Utsunomiya, JP;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G03B 2/772 ; G03B 2/742 ; G03B 2/754 ;
U.S. Cl.
CPC ...
G03B 2/772 ; G03B 2/742 ; G03B 2/754 ;
Abstract

An illumination optical system for use in an exposure apparatus for projecting a pattern of a mask onto a substrate. The illumination system includes a first beam shape changing optical system for transforming a light, supplied from a light source, into a slit-like light of an oblong shape, and a second beam shape changing optical system for transforming the slit-like light of oblong shape into a slit-like light of an arcuate shape, the second beam shape changing optical system having a prism element. The mask is illuminated with the slit-like light of arcuate shape.


Find Patent Forward Citations

Suzuki, Akiyoshi. (2002). Illumination optical system and exposure apparatus having the same (U.S. Patent No. 6441886). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6441886

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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