The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 27, 2002

Filed:

May. 09, 2000
Applicant:
Inventors:

Masato Takahashi, Yokohama, JP;

Futoshi Mori, Kawasaki, JP;

Assignee:

Nikon Corporation, Tokyo, JP;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G03B 2/742 ; G03B 2/758 ; G03B 2/762 ;
U.S. Cl.
CPC ...
G03B 2/742 ; G03B 2/758 ; G03B 2/762 ;
Abstract

An optical system for illumination is divided into a first optical system ( A) and a second optical system ( B). The second optical system ( B) is fixed to an exposure apparatus main body (SP). The exposure apparatus main body (SP) is provided to a base frame ( ) via hard rubbers ( A and B) and piezo actuators ( A and B), and isolates vibration from the surface of the floor. The first optical system ( A) is supported separately from the exposure apparatus (SP) via actuators such as air mounts ( A and B) and voice coil motors (VCMs) ( A, B, A, and B) etc. A control system ( ) compensates for the relative positional deviation between the first optical system ( A) and the second optical system ( B) detected by displacement sensors ( A and B) by controlling the position of the first optical system ( A) by driving the above described actuators.


Find Patent Forward Citations

Takahashi, Masato. (2002). Projection exposure apparatus (U.S. Patent No. 6441884). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6441884

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