The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 27, 2002
Filed:
Aug. 17, 2000
Applicant:
Inventors:
Hamid Partovi, Sunnyvale, CA (US);
Chun Jiang, San Jose, CA (US);
Bill Yowjuang Liu, San Jose, CA (US);
Assignee:
Advanced Micro Devices, Inc., Sunnyvale, CA (US);
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 2/1768 ;
U.S. Cl.
CPC ...
H01L 2/1768 ;
Abstract
Air gap insulation regions are formed selectively within high parasitic capacitance regions in which conductive lines are closely proximate and generates an intolerable amount of parasitic capacitance. The selective formation of air gap insulation regions improves circuit performance by reducing the parasitic capacitance and device reliability by reducing the stress fracture problem of conventional air gap insulation schemes.