The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 27, 2002
Filed:
Nov. 01, 1999
Akihiro Sonoda, Tokyo, JP;
Oki Electric Industry Co, Ltd., Tokyo, JP;
Abstract
In order to provide a mask and a method for manufacturing a semiconductor device that achieve consistency in the resist pattern dimensions, a main pattern provided for the purpose of semiconductor element production and an additional pattern provided for the purpose of exposure quantity adjustment are drawn at a reticle At the reticle the additional pattern achieves a regularity almost identical to that of the main pattern At the same time, the additional pattern has a specific shift relative to the main pattern By achieving an optimal degree of shift between the additional pattern and main pattern at the reticle consistency in the resist pattern dimensions can be achieved without adversely affecting the process of element pattern formation.