The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 20, 2002
Filed:
Jan. 13, 2000
Robin A. Reeder, El Segundo, CA (US);
Raytheon Company, Lexington, MA (US);
Abstract
A system ( ) for rotating a polarization state of a beam of electromagnetic energy ( ) of the present invention. The system ( ) includes a first mechanism ( ) for receiving the beam of electromagnetic energy ( ). The beam of electromagnetic energy ( ) is characterized by a first arbitrary polarization state oriented at a first angle. A second mechanism ( ) orients the first arbitrary polarization state, via one or more waveplates ( ), at a second angle that is different from the first angle. In a specific embodiment, the one or more waveplates ( ) include a first quarter waveplate ( ) having a principal axis ( ) angled at 45° from horizontal relative to a given reference frame. A second quarter waveplate ( ) is angled at −45°. The second mechanism ( ) includes a phase mechanism ( ) that is positioned between the first quarter waveplate ( ) and the second quarter waveplate ( ) and introduces a desired phase shift to the polarization state of the beam of electromagnetic energy ( ) output from the first quarter waveplate ( ). The desired phase shift is twice the difference between the first angle and the second angle, which corresponds to a desired angle of rotation of the first arbitrary polarization state.