The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 20, 2002
Filed:
Jul. 13, 2000
Yoshihisa Oka, Chigasaki, JP;
Yutaka Sugiyama, Yokohama, JP;
Kenji Suzuki, Yokohama, JP;
Hironori Horie, Yokohama, JP;
Makoto Furukawa, Zushi, JP;
Nippon Shokubai Co., Ltd., Osaka, JP;
Abstract
A method for the production of monoethylene glycol of high purity is disclosed which comprises subjecting ethylene to catalytic vapor phase oxidation with a molecular oxygen-containing gas thereby obtaining an ethylene oxide-containing gas, exposing the ethylene oxide-containing gas to an absorbing solution and stripping the resultant ethylene oxide-containing solution in a stripper, condensing the vapor emanating from the top of the stripper thereby obtaining crude ethylene oxide, subjecting at least part of the crude ethylene oxide to a hydration reaction, adding an alkaline substance to the hydration reaction solution in an amount of not less than 0.5 atomic equivalent weight relative to the chlorine atom contained in the hydration reaction solution or dehydrating the hydration reaction solution and introducing the side cut technique to the monoethylene glycol rectification column, and acquiring the monoethylene glycol from the side cut part.