The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 20, 2002
Filed:
Oct. 27, 1999
Applicant:
Inventor:
Qunjie Wang, Hockessin, DE (US);
Assignee:
Agilent Technologies, Inc., Palo Alto, CA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C08F 8/34 ; C08F 8/32 ;
U.S. Cl.
CPC ...
C08F 8/34 ; C08F 8/32 ;
Abstract
A low-swelling, highly crosslinked, macroporous polystyrene resin containing functional groups which are capable of selectively binding to reaction impurities, such as excess reactant or reaction by-products, which are contained in a reaction medium. The reaction impurities can thereby be efficiently removed from the reaction medium, providing a convenient method for product purification.
Wang, Qunjie. (2002). Low-swelling, macroporous polymer-supported reagents for organic synthesis and purification (U.S. Patent No. 6437012). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6437012
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile