The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 20, 2002

Filed:

Oct. 30, 2000
Applicant:
Inventors:

Yongcai Wang, Webster, NY (US);

Kevin M. O'Connor, Webster, NY (US);

Melvin M. Kestner, Hilton, NY (US);

James L. Bello, Rochester, NY (US);

Assignee:

Eastman Kodak Company, Rochester, NY (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03C 1/76 ; G03C 1/74 ; G03C 5/26 ; G03C 1/106 ; G03C 1/108 ;
U.S. Cl.
CPC ...
G03C 1/76 ; G03C 1/74 ; G03C 5/26 ; G03C 1/106 ; G03C 1/108 ;
Abstract

The present invention relates to photographic elements having a protective overcoat that resists fingerprints, common stains, and spills. The overcoat comprises an epoxy material, an acid polymer, a water-soluble hydrophilic binder and an associative thickener. In one embodiment, a photographic element includes a support, at least one silver halide emulsion layer superposed on the support and a processing-solution-permeable overcoat overlying the silver halide emulsion layer that becomes water-resistant in the final product without requiring lamination or fusing. The present invention is also directed to a method of making a print involving developing the photographic element.


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