The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 20, 2002
Filed:
Jul. 11, 2000
Etsuo Ogino, Osaka, JP;
Kenji Mori, Osaka, JP;
Yoshifumi Kijima, Osaka, JP;
Tetsuro Kawahara, Osaka, JP;
Kazuhiro Doushita, Osaka, JP;
Hiroyuki Inomata, Osaka, JP;
Nippon Sheet Glass Co., Ltd., Osaka, JP;
Abstract
A conductive sinter obtained from a mixture of titanium oxide particles and 2.5% by weight niobium oxide particles is used as a target in direct current sputtering to form a photocatalytically active film mainly comprising titanium oxide on a glass substrate. The target has a surface resistance of 500 &OHgr;/□ or lower and the sputtering is conducted while heating the substrate at 230° C. The photocatalytically active film is based on an amorphous matrix. This process is free from problems of a conventional process in which a photocatalytically active titanium oxide film is deposited by reactive sputtering using titanium metal as a target. The problems are that the substrate needs to be heated to 350° C. or higher and that the deposited film does not have high photocatalytic activity.