The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 20, 2002

Filed:

Sep. 11, 1998
Applicant:
Inventors:

Gang Sun, Davis, CA (US);

Young Hee Kim, Davis, CA (US);

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
A01N 2/534 ; A01N 2/500 ; A01N 3/318 ;
U.S. Cl.
CPC ...
A01N 2/534 ; A01N 2/500 ; A01N 3/318 ;
Abstract

The present invention provides durable and refreshable antimicrobial polymers and methods for preparing the same. In some instances, the polymer is a textile. These textiles have excellent colorfastness and washfastness. The antimicrobial fabrics of this invention are suitable for sportswear, antiodor carpets, films, plastics, toys and medical uses.


Find Patent Forward Citations

Sun, Gang. (2002). Antimicrobial treatment of polymers (U.S. Patent No. 6436419). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6436419

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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