The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 13, 2002
Filed:
Dec. 06, 2000
Matthias Seel, München, DE;
T.I.L.L. Photonics GmbH, Martinsried, DE;
Abstract
A device for deflecting a beam, having a first beam deflection unit ( ) and a mirror arrangement ( ) which images the deflection point (P) onto a destination point (P′). The mirror arrangement ( ) is made rotationally-symmetrical over at least a certain range of deflection angles, the deflection point (P) and the destination point (P′) being located on or near the axis ( ) of rotational symmetry ( ) of the mirror arrangement. There can be a second deflection unit ( ) at the destination point (P′). Furthermore, a process for deflecting a given beam by means of rotation of the mirror surface of a planar mirror ( ) from a middle position involves setting the location of the axis ( ) of rotation of the plane mirror with respect to the planar mirror outside the mirror surface, the location of the axis of rotation with respect to the given beam being selected by determining the point at which the minimum variation of intersection points of rearward beam extensions occurs.