The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 13, 2002
Filed:
Dec. 14, 1998
Shenbo Yu, Lowell, MA (US);
Richard G. Comeau, Bedford, MA (US);
Craig C. Cook, Wayland, MA (US);
Fred W. Andree, Brookline, MA (US);
Oak Technology, Inc., Sunnyvale, CA (US);
Abstract
A stochastic screening mask is provided for rendering halftone images. A filter controlled force masking method is used to vary the mask patterns from regularity to randomness. Dot size (amplitude), dot number (frequency), and dot shape are modulated integrally at each gray level during the generation of the mask. The single pixel limit for blue noise making is broken down by this approach. The halftone patterns generated with this method can have visually pleasing blue noise attribute. This new screening method would provide flexible solutions for different types of printing processes.