The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 13, 2002

Filed:

Apr. 18, 2000
Applicant:
Inventors:

Victor V. Kulish, Sumy, 244035, UA;

Peter B. Kosel, Cincinnati, OH (US);

Alexandra C. Melnyk, Powell, OH (US);

Nestor Kolcio, Plain City, OH (US);

Assignee:

Other;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H05H 3/00 ; H05H 1/500 ;
U.S. Cl.
CPC ...
H05H 3/00 ; H05H 1/500 ;
Abstract

An improved device utilizing an inductive undulative EH-accelerator is proposed for acceleration and cooling of plasma fluxes, and beams of charged particles, and separate charged particles; and for forming of neutral molecular beams, and neutron beams (inductive undulative EH-accelerator) is proposed. The device consists of an electromagnetic undulation system, whose driving system for electromagnets, is made in the form of a radio frequency (RF) oscillator operating in the frequency range from about 100 KHz to 10 GHz; which is connected with coils of the undulatve system of electromagnets, and a source of accelerated particles, which is provided in the form of source of plasma or neutral molecular beams, or positive or negative ions, or charged particle beams, or separate charged particles. Other distinguishing features of the device are that at least a part of the cores and magneto-conductors of the electromagnetic undulation system is made from ferrite-type materials, and that the electromagnetic undulation system is used for purposes of acceleration of separate charged particles, or cooling and acceleration of charged particle beams and plasma fluxes. This is a compact system. The invention is related to such uses for which especially the problem of reducing of overall size, weight and cost of a device and increasing of its reliability is required.


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