The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 13, 2002
Filed:
Feb. 25, 1999
John C. Schumacher, Oceanside, CA (US);
Other;
Abstract
This invention is directed to a method and apparatus of delaying the reaction between a first reactive gas and a second reactive gas as the first reactive gas flows into the second reactive gas. The method comprises the steps of surrounding the first reactive gas with a non-reactive gas to form an insulated first reactive gas; and flowing the insulated first reactive gas into the second reactive gas. A sweep gas is used to impart momentum to the insulated first reactive gas. The apparatus comprises three coaxial tubular members which are used to introduce the first reaction gas, the non-reactive gas, and the sweep gas. The apparatus may be installed in a semiconductor device fabrication process either just upstream of the house exhaust line or upstream of an ODC or air pollution abatement device.