The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 13, 2002
Filed:
Jan. 10, 2001
Nippon Sheet Glass Co., Ltd., Osaka, JP;
Abstract
In a method for forming a planar microlens according to the present invention, a wet etching is conducted to a glass substrate for a stamper while it is covered with a mask. After the etching is conducted and the mask is removed a wet etching is conducted again to the glass substrate to form densely arranged concave portions thereon, and thereby a stamper is obtained. An uncured resin is applied on the forming surface of the stamper, a glass substrate for a planar microlens array (MLA) is pressed thereto, and thereby the uncured resin is formed. The uncured resin is cured by applying an ultraviolet irradiation thereto and the stamper is released therefrom. The resin layer is removed by a reactive ion etching and whereupon the substrate is etched in a form corresponding to the form of the resin layer and whereby an all-glass microlens of high precision is obtained.