The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 13, 2002
Filed:
Aug. 04, 1994
Applicant:
Inventors:
Monte A. Douglas, Coppell, TX (US);
Richard A. Stoltz, Plano, TX (US);
Assignee:
Texas Instruments Incorporated, Dallas, TX (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 2/13065 ; H01L 2/1027 ;
U.S. Cl.
CPC ...
H01L 2/13065 ; H01L 2/1027 ;
Abstract
This is a method for masking a structure for patterning micron and submicron features, the method comprises: forming at least one monolayer of adsorbed molecules on the structure; prenucleating portions of the adsorbed layer by exposing the portions corresponding to a desired pattern of an energy source ; and selectively forming build-up layers over the prenucleated portions to form a mask over the structure to be patterned. Other methods are also disclosed.