The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 13, 2002
Filed:
Jan. 22, 2001
Koji Sugioka, Saitama, JP;
Shlomo Ruschin, Tel Aviv, IL;
Jie Zhang, Beijing, CN;
Satoshi Wada, Miyagi, JP;
Hideo Tashiro, Saitama, JP;
Koichi Toyoda, Saitama, JP;
The Institute of Physical and Chemical Research, Saitama, JP;
Abstract
A method for controlling an index of refraction of silica glass, and in particular quartz glass, is disclosed. The method for controlling the index of refraction of silica glass includes the use of a vacuum ultraviolet laser beam having the same or shorter wavelength absorbable by the silica glass. The vacuum ultraviolet laser beam is irradiated to the silica glass to cause photodissociation of a Si—O bond at the point of irradiation. An index of refraction may also be altered using a vacuum ultraviolet laser beam having a longer wavelength absorbable by the silica glass.